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KMID : 0362319920170010181
Journal of Korean Academy of Operative Dentistry
1992 Volume.17 No. 1 p.181 ~ p.190
Quantitative analysis of residual monomers in visible light - cured resins


Abstract
The purpose of this study was to estimate the contents of the residual monomers, such as Bis-GMA and TEGDMA.
In this study, materials used were six kinds of anterior and posterior visible light-cured resins. Resins were placed in disk-shaped Teflon mold (8.5mm in diameter, 2.0mm in thickness), and cured for 20 seconds with visible light source attached
wide
diameter lightguide.
The specimens were immersed in 10ml ethanol and stored for 5 days at 37¡É.
The concentration of residual monomers in eluate solution was analysed by HPLC, and the following results are obtained.
1. The residual Bis-GMA and TEGDMA were detected in all materials used, and the ranges of quantity of the residual Bis-GMA was 0.101-1.236 wt% and that of TEGDMA was 0.230-5 794 wt%.
2. The contents of residual TEGDMA was detected higher than that of residual Bis-GMA (P<0.01).
3. The content of residual monomers was detected to be highest in Bis-Fil M as microfilled type.
4. In most of the materials used, there was no significant difference in the contents of residual monomers between anterior and posterior light-cured resins.
KEYWORD
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